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45nm High-k Metal Gate Silicon Technology

Touted as the “biggest advancement in fundamental transistor design in 40 years,” the new 45nm High-k process is what makes the new core possible. This technology allows for further CPU die shrinkage while reducing electrical leakage. This leakage is generally responsible for excess heat generation and power consumption. What this ultimately means for Intel processors is greater transistor density, lower transistor switching power, faster transistor switching speed, and overall better thermal and power efficiency. For the consumer, this will increase the speed of future processors, allow Intel to add new features, and lower costs due to a higher density of chips per manufactured processor wafer.